Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-11-28
2006-11-28
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07141337
ABSTRACT:
A phase shift mask includes a transparent substrate, a semi-dense pattern, and a dense pattern. The semi-dense pattern is formed on the transparent substrate including a plurality of phase shift regions and non-phase shift regions arranged successively. The dense pattern is formed on the transparent substrate including a plurality of non-phase shift regions, phase shift regions, and non-transparent regions.
REFERENCES:
patent: 6114095 (2000-09-01), Nakabayashi et al.
patent: 6150058 (2000-11-01), Tu et al.
patent: 6210841 (2001-04-01), Lin et al.
patent: 6582858 (2003-06-01), Lai et al.
Chen Ming-Jui
Hung Wen-Tien
Lin Chin-Lung
Yang Chuen-Huei
Hsu Winston
Rosasco S.
United Microelectronics Corp.
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