4. Coating processes
  5. Direct application of electrical, magnetic, wave, or...
  6. Plasma

Chih-Hsiang Hsiao

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Control system for multi-layer chemical mechanical polishing...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Reexamination Certificate

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Method for fabricating passivation layer on metal pad

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Method for increasing etch removal rate of silicon oxynitride

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent

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Method for preventing oxide recess formation in a shallow trench

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
Patent

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Method of fabricating shallow trench isolation

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Patent

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Profile ID: LFUS-PAI-P-732328

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