4. Semiconductor device manufacturing: process
  5. Coating of substrate containing semiconductor region or of...
  6. Insulative material deposited upon semiconductive substrate

Ashima B. Chakravarti

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Borophosphosilicate glass incorporated with fluorine for low the

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Patent

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CMOS device structure with improved PFET gate electrode

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Reexamination Certificate

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Deposition of carbon and nitrogen doped poly silicon films,...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Fabricating semiconductor structures

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Reexamination Certificate

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Fluorine doped plasma enhanced phospho-silicate glass, and proce

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent

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Profile ID: LFUS-PAI-P-392477

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