Fluorine doped plasma enhanced phospho-silicate glass, and proce

Details Fluorine doped plasma enhanced phospho-silicate glass, and proce Fluorine doped plasma enhanced phospho-silicate glass, and proce

1995-11-27

1997-07-01

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427255, 4272551, 4272552, B05D 306

Patent

active

056436408

ABSTRACT:
A fluorinated phosphosilicate glass (FPSG) is produced in a plasma-enhanced chemical vapor deposition process (PECVD) in which the plasma source comprises conventional phosphosilicate glass-forming materials together with one or more fluorine gas-forming materials. The deposited fluorine-gas enhances the filling of gaps or voids with dielectric glass compositions by etching the top of the via holes or gaps during the filling operation. The present fluorine-doped phosphosilicate glass compositions are stable compared to conventional phosphosilicate glass compositions which are relatively unstable and unsatisfactory for use as gap-filling dielectric glass compositions.

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