4. Semiconductor device manufacturing: process
  5. Formation of semiconductive active region on any substrate

Ali Zojaji

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Carbon precursors for use during silicon epitaxial film...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method and system for deposition tuning in an epitaxial film...

Semiconductor device manufacturing: process – With measuring or testing
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Method of ultra-shallow junction formation using Si film...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Methods of forming carbon-containing silicon epitaxial layers

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With a step of measuring – testing – or sensing
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Use of Cl2 and/or HCl during silicon epitaxial film formation

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Profile ID: LFUS-PAI-P-2320360

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