4. Radiant energy
  5. Electrically neutral molecular or atomic beam devices and...

Akihisa Sekiguchi

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Formation of a disposable spacer to post dope a gate conductor

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Forming gate oxides having multiple thicknesses

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Method for separately optimizing thin gate dielectric of...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Method of fabricating shallow trench isolation by ultra-thin...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
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Method of making sub-lithographic features

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Profile ID: LFUS-PAI-P-1264166

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