Coating apparatus – Gas or vapor deposition – Chamber seal
Patent
1996-06-28
1997-12-30
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Chamber seal
118729, 414935, 49 31, 494751, 494781, 20429823, C23C 1600
Patent
active
057025339
ABSTRACT:
A pinch seal in which particle generation by frictional contact is prevented so that the pinch seal can be used in a semiconductor processing apparatus where elimination of particulate contamination is desirable. The pinch seal is particularly adapted for use in connection with a semiconductor wafer transport device, such as a linear transport device. The pinch seal is formed in a barrier provided between a transport device and a semiconductor processing work environment. One or more support members for transporting a wafer extend through the pinch seal. In one embodiment, the pinch seal includes a flexible sealing member with a magnetic strip extending along the length of the flexible sealing member. A mechanism which does not physically contact the flexible sealing member, such as a device generating a magnetic field, is used to selectively open and close the flexible sealing member to prevent contact between the flexible sealing member and the support member passing through the flexible sealing member while retaining the isolating function of the shielding member.
REFERENCES:
patent: 4672888 (1987-06-01), Crombie et al.
patent: 4833790 (1989-05-01), Spencer et al.
patent: 5538610 (1996-07-01), Gesche et al.
Krieg Kenneth R.
Mundt Randall S.
Breneman R. Bruce
Lam Research Corporation
Lund Jeffrie R.
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