Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2006-07-07
2010-11-23
Duda, Kathleen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S322000, C430S330000
Reexamination Certificate
active
07838205
ABSTRACT:
Photolithography processing methods by which a photoresist layer is deposited, a portion of the photoresist layer is exposed to electromagnetic radiation to transfer a reticle pattern thereto, and the exposed portion of the photoresist layer is treated with thermal energy while being subjected to an electric field, wherein the electric field is configured to substantially limit diffusion of the exposed photoresist layer portion to anisotropic diffusion.
REFERENCES:
patent: 5258266 (1993-11-01), Tokui et al.
patent: 2003/0008246 (2003-01-01), Cheng et al.
patent: 2004/0010769 (2004-01-01), Chang et al.
patent: 2006/0189146 (2006-08-01), Oweyang et al.
Chang Vincent
Chen Kuei Shun
Chen Norman
Liu George
Duda Kathleen
Haynes and Boone LLP
Taiwan Semiconductor Manufacturing Company , Ltd.
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