Top antireflective coating film

Details Top antireflective coating film Top antireflective coating film

1997-12-09

2000-05-02

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430324, 428421, G03F 700

Patent

active

060570806

ABSTRACT:
Enhanced fidelity of pattern transfer of aqueous developable photoresist compositions is achieved with top antireflective coatings which are fluorine-containing and have a refractive index approximately equal to the square root of the underlying photoresist and which are removable in the developer for the photoresist.

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T. Tanaka, et al., J. Electrochem. Soc., 137 pp. 3900-3905 (1990) A New Photolithography Technique with Antireflective Coating on Resist: ARCOR.
T. Tanaka, et al., J. Appl. Phys. 67, 2617-22 (1990), "A New Method for Reflectivity Measurement at the Interface between Resist and Substrate".
T. Tanaka, et al., Chem Abs., 107:87208y (1987), "Photolithography".

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