Textured chamber surface

Details Textured chamber surface Textured chamber surface

2004-06-07

2009-11-17

Chea, Thorl (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S313000, C430S320000, C430S323000, C451S038000

Reexamination Certificate

active

07618769

ABSTRACT:
A method of fabricating a process chamber component having a textured surface includes applying a resist layer on an underlying surface of the component. A predetermined pattern of apertures is formed in the resist layer that exposes the underlying surface of the component. The underlying surface is etched through the apertures in the resist layer to form a textured surface having raised features with top corners. The resist layer is removed, and a treatment step is performed to form top corners that are rounded. In another method, the textured surface is formed by providing a patterned mask having apertures above the surface of the component. A material is sprayed through the apertures in the patterned mask and onto the surface to form a textured surface with raised features having the material.

REFERENCES:
patent: 3482082 (1969-12-01), Isreeli
patent: 4913784 (1990-04-01), Bogenschutz et al.
patent: 5064511 (1991-11-01), Gobetti
patent: 5228245 (1993-07-01), Rice et al.
patent: 5391275 (1995-02-01), Mintz
patent: 5401319 (1995-03-01), Banholzer et al.
patent: 5460694 (1995-10-01), Schapira et al.
patent: 5474649 (1995-12-01), Kava et al.
patent: 5695825 (1997-12-01), Scruggs
patent: 5910338 (1999-06-01), Donde et al.
patent: 5916454 (1999-06-01), Richardson et al.
patent: 6150762 (2000-11-01), Kim et al.
patent: 6227435 (2001-05-01), Lazarz et al.
patent: 6250251 (2001-06-01), Akiyama et al.
patent: 6306226 (2001-10-01), Iino et al.
patent: 6423175 (2002-07-01), Huang et al.
patent: 6506312 (2003-01-01), Bottomfield
patent: 6558505 (2003-05-01), Suzuki et al.
patent: 6623597 (2003-09-01), Han et al.
patent: 2002/0086118 (2002-07-01), Chang et al.
patent: 2003/0047464 (2003-03-01), Sun et al.
patent: 2003/0173526 (2003-09-01), Popiolkowski et al.
patent: 2004/0056211 (2004-03-01), Popiolkowski et al.

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