Single electron transistor and method of manufacturing the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S265000, C438S962000, C257S024000, C257SE29071, C257SE21403, C257SE21404, C257SE21408, C977S937000, C977S938000

Reexamination Certificate

active

07955932

ABSTRACT:
A single electron transistor includes source/drain layers disposed apart on a substrate, at least one nanowire channel connecting the source/drain layers, a plurality of oxide channel areas in the nanowire channel, the oxide channel areas insulating at least one portion of the nanowire channel, a quantum dot in the portion of the nanowire channel insulated by the plurality of oxide channel areas, and a gate electrode surrounding the quantum dot.

REFERENCES:
patent: 6127246 (2000-10-01), Fukuda
patent: 7002207 (2006-02-01), Kim et al.
patent: 7427788 (2008-09-01), Li et al.
patent: 7452778 (2008-11-01), Chen et al.
patent: 2004/0097023 (2004-05-01), Park et al.
patent: 2005/0121706 (2005-06-01), Chen et al.
patent: 2005/0142753 (2005-06-01), Koh
patent: 2008/0041814 (2008-02-01), Romano et al.
patent: 2008/0149919 (2008-06-01), Ernst et al.
patent: 10-2004-0029582 (2003-12-01), None
patent: 10-2004-0094179 (2004-11-01), None
patent: 10-2005-0006634 (2005-01-01), None
patent: 102005010382 (2005-01-01), None
patent: 10-2005-0103821 (2005-11-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Single electron transistor and method of manufacturing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Single electron transistor and method of manufacturing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Single electron transistor and method of manufacturing the same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2659304

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.