Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2011-06-07
2011-06-07
Smith, Zandra (Department: 2822)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S265000, C438S962000, C257S024000, C257SE29071, C257SE21403, C257SE21404, C257SE21408, C977S937000, C977S938000
Reexamination Certificate
active
07955932
ABSTRACT:
A single electron transistor includes source/drain layers disposed apart on a substrate, at least one nanowire channel connecting the source/drain layers, a plurality of oxide channel areas in the nanowire channel, the oxide channel areas insulating at least one portion of the nanowire channel, a quantum dot in the portion of the nanowire channel insulated by the plurality of oxide channel areas, and a gate electrode surrounding the quantum dot.
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Li Ming
Suk Sung-Dae
Yeo Kyoung-hwan
Yeoh Yun-Young
Joy Jeremy J
Lee & Morse P.C.
Samsung Electronics Co,. Ltd.
Smith Zandra
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