Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-12-13
2005-12-13
Lee, Sin J. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S327000, C430S328000, C430S330000, C430S331000, C430S905000, C430S907000, C430S910000, C430S914000
Reexamination Certificate
active
06974655
ABSTRACT:
A chemically amplified photo-resist includes a polymer containing acid-labile radicals attached to a polar group and also contains anchor groups that allow attachment of a consolidating agent. The polymer includes first repeating units containing siloxane groups. The photoresist on the one hand exhibits an enhanced transparency for short-wavelength radiation and on the other hand permits chemical consolidation of the structured resist. A process for producing structured resists is a also described.
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Domke Wolf-Dieter
Eschbaumer Christian
Hohle Christoph
Rottstegge Jörg
Sebald Michael
Greenberg Laurence A.
Infineon - Technologies AG
Lee Sin J.
Locher Ralph E.
Stemer Werner H.
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