Christoph Hohle

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Amplification of resist structures of fluorinated resist...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
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CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
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Negative resist process with simultaneous development and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
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Photoresist based on polycondensates and having an increased...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
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Photoresist suitable for use in 157 nm photolithography and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
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Profile ID: LFUS-PAI-P-2365927

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