Profile control platen

Abrading – Abrading process – Glass or stone abrading

Reexamination Certificate

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Details

C451S504000

Reexamination Certificate

active

06913518

ABSTRACT:
A platen for chemical mechanical polishing of a substrate includes a surface upon which a polishing pad can be placed, a support structure, and a controller. The surface has a first region and a second region and is operable to exert force against the polishing pad during polishing. The support structure is located beneath the second region and is operable to cause the second region to exert more force than the first region. The controller is operable to adjust the amount of force that is exerted by the second region.

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patent: 5435772 (1995-07-01), Yu
patent: 5558563 (1996-09-01), Cote et al.
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patent: 5860851 (1999-01-01), Beppu et al.
patent: 5931719 (1999-08-01), Nagahara et al.
patent: 6267659 (2001-07-01), Chen et al.
patent: 0744009 (1970-07-01), None

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