Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Reexamination Certificate
2005-05-31
2005-05-31
Huff, Mark F. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
C430S311000, C430S315000, C430S325000, C430S326000, C430S330000, C430S270100, C430S331000
Reexamination Certificate
active
06899997
ABSTRACT:
A process for chemically amplifying structured resists includes applying a chemically amplified resist to a substrate and structuring it in a customary manner. Preferably, the amplification agent is applied in an aqueous phase to the structured resist and, after chemical amplification is complete, excess agent is removed by an aqueous wash medium. By using water as a solvent for the amplification agent and as a wash medium, it is possible to avoid organic solvents that constitute an explosion hazard. Furthermore, removal of partially exposed resist sections is suppressed.
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Grant & Hackh, Chemical Dictionary, 1987, McBraw-Hill, Inc., 5th Edition, pp. 22 and 564.
Falk Gertrud
Kern Marion
Richter Ernst-Christian
Rottstegge Jörg
Sebald Michael
Huff Mark F.
Infineon - Technologies AG
Locher Ralph E.
Ruggles John
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