Process for low temperature plasma deposition of an optical...

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

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Reexamination Certificate

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11131899

ABSTRACT:
A method of processing a workpiece includes introducing an optical absorber material precursor gas into a chamber containing the workpiece, generating an RF oscillating toroidal plasma current in a reentrant path that includes a process zone overlying the workpiece by applying RF source power, so as to deposit a layer of an optical absorber material on the workpiece, and exposing the workpiece to optical radiation that is at least partially absorbed in the optical absorber layer.

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