Photoresist composition for multi-micro nozzle head coater

Details Photoresist composition for multi-micro nozzle head coater Photoresist composition for multi-micro nozzle head coater

2008-05-27

2008-05-27

Chu, John S. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S191000, C430S192000, C430S193000, C427S059000, C427S240000, C427S241000, C427S346000

Reexamination Certificate

active

10750845

ABSTRACT:
The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits.The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.

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BYK-307, BYK-333 and BYK-344 product list from www.BYK-Chemie.com for the ingredients in the commercial products.

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