Photoresist based on polycondensates and having an increased...

Details Photoresist based on polycondensates and having an increased... Photoresist based on polycondensates and having an increased...

2006-05-09

2006-05-09

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S907000, C430S906000, C430S908000, C430S325000, C430S326000, C430S914000

Reexamination Certificate

active

07041426

ABSTRACT:
A photoresist includes a polymer which has acid-cleavable groups in its main chain. The polymer can thus be cleaved by acid into short cleavage products which can be removed from the substrate through the use of a developer. The polymer is completely or partially fluorinated, and consequently has an improved transparency to light of short wavelengths.

REFERENCES:
patent: 4663269 (1987-05-01), Narang et al.
patent: 5453341 (1995-09-01), Schwalm
patent: 39 14 407 (1990-10-01), None
patent: 1 089 129 (2001-04-01), None
Reddy et al. (“Hexafluoroisopropoxy-containing Polyesters”, Polymer, vol. 37, No. 21, pp. 4873-4875.

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