Semiconductor device manufacturing: process – Making passive device – Resistor
Reexamination Certificate
2009-07-10
2010-12-14
Stark, Jarrett J (Department: 2822)
Semiconductor device manufacturing: process
Making passive device
Resistor
C438S102000, C438S104000, C257SE21068, C257SE21078
Reexamination Certificate
active
07851323
ABSTRACT:
The present invention, in one embodiment, provides a memory device that includes a phase change memory cell; a first electrode; and a layer of filamentary resistor material positioned between the phase change memory cell and the first electrode, wherein at least one bistable conductive filamentary pathway is present in at least a portion of the layer of filamentary resistor material that provides electrical communication between the phase change memory cell and the first electrode.
REFERENCES:
patent: 2003/0035315 (2003-02-01), Kozicki
patent: 2006/0027893 (2006-02-01), Meijer et al.
patent: 2008/0304311 (2008-12-01), Philipp et al.
T. Sakamoto et al., A Nonvolatile Programmable Solid Electrolyte Nanometer Switch, IEEE International Solid-State Circuits Conference, 2004, Session 16.
C. Rossel et al., Electrical Current Distribution Across a Metal-Insulator-Metal Structure During Bistable Switching, Journal of Applied Physics, 2001, pp. 2892-2898, vol. 90, No. 6.
S. Karg et al., Nanoscale Resistive Memory Device Using SrTiO3 Films, IBM Research, Zurich Research Laboratory, Ruschlikon, Switzerland.
Breitwisch Matthew J.
Cheek Roger W.
Joseph Eric A.
Lam Chung H.
Meijer Gerhard Ingmar
Alexanian Vazken
International Business Machines - Corporation
Scully , Scott, Murphy & Presser, P.C.
Stark Jarrett J
Tynes, Jr. Lawrence
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