Oxide film forming method

Details Oxide film forming method Oxide film forming method

2005-09-27

2005-09-27

Chaudhari, Chandra (Department: 2829)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

By reaction with substrate

C438S799000, C438S903000

Reexamination Certificate

active

06949478

ABSTRACT:
A method of forming an oxide film having high insularity capability is performed within an ultra clean environment, using charged particles.

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