Coating apparatus – Gas or vapor deposition – Work support
Patent
1996-09-16
1999-08-24
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Work support
118500, 118503, 118504, 20429811, 20429815, 438758, C23C 1600
Patent
active
059420413
ABSTRACT:
A clamp used in clamping semi-conductor wafers during processing operations permits ready release of the wafer and avoids adherence of the clamp to materials deposited onto the wafer which otherwise tend to stick the wafer to the clamp. Adhesion of the deposited materials to the clamp is avoided by providing the clamping surfaces of the clamp with a minimum surface roughness achieved by machining, grinding, etching or other techniques.
REFERENCES:
patent: 4964594 (1990-10-01), Webb
patent: 5391275 (1995-02-01), Mintz
patent: 5513594 (1996-05-01), McClanahan
patent: 5556500 (1996-09-01), Hasegawa et al.
Huang Tzu-Hsin
Lo Yung-Tsun
Tsai Pei-Wei
Tseng Hua-Jen
Bueker Richard
Lund Jeffrie R.
Mosel-Vitelic, Inc.
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