Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2005-12-06
2009-10-20
Chu, Chris C (Department: 2815)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S629000, C438S700000, C438S745000, C257SE23067, C257S700000, C029S852000
Reexamination Certificate
active
07605075
ABSTRACT:
A multilayer circuit board is provided that includes at least two insulating layers each sandwiched by circuit layers, thus having at least one internal circuit layer sandwiched by the at least two insulating layers. Via holes are formed in one or more of the insulating layers at the same pitch as bump electrodes of an integrated circuit chip, which permit insertion of the bump electrodes of an integrated circuit chip into the via holes of the multilayer circuit board. Metal films formed within the via holes are electrically connected to at least one of the circuit layers. An internal capacitor may be formed in a predetermined area of an insulating layer and predetermined areas of circuit layers which sandwich the predetermined area of the insulating layer and are opposed to each other. An internal resistor may be formed in an inner circuit layer.
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Office Action in Japanese counterpart application 2004-353236 dated Mar. 11, 2008.
Ishida Mitsuya M.
Okabe Shuichl
Orii Yasumitsu
C. Li Todd M.
Chu Chris C
International Business Machines - Corporation
Petrokaitis Joseph
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