Multi-region processing system and heads

Coating processes – Coating by vapor – gas – or smoke

Reexamination Certificate

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C427S569000, C118S722000

Reexamination Certificate

active

08039052

ABSTRACT:
The various embodiments of the invention provide for relative movement of the substrate and a process head to access the entire wafer in a minimal space to conduct combinatorial processing on various regions of the substrate. The heads enable site isolated processing within the chamber described and method of using the same are described.

REFERENCES:
patent: 6746539 (2004-06-01), Sun et al.
patent: 2005/0016463 (2005-01-01), Hirano
patent: 2006/0127599 (2006-06-01), Wojak
patent: 2006/0231031 (2006-10-01), Dings et al.
patent: 2005120456 (2005-05-01), None

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