Method of forming fine patterns

Details Method of forming fine patterns Method of forming fine patterns

2008-09-18

2009-06-30

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S313000, C430S315000, C430S322000, C430S330000, C427S271000, C427S372200, C427S384000, C427S385500, C438S760000

Reexamination Certificate

active

07553610

ABSTRACT:
It is disclosed a method of forming fine patterns comprising: covering a substrate having photoresist patterns with an over-coating agent for forming fine patterns, applying heat treatment to cause thermal shrinkage of the over-coating agent so that the spacing between adjacent photoresist patterns is lessened by the resulting thermal shrinking action, and removing the over-coating agent substantially completely by way of bringing thusly treated substrate into contact with a remover solution for over 60 seconds.

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“Proc. SPIE”, vol. 4345, pp. 647-654.

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