Yoshiki Sugeta

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Agent for forming coating for narrowing patterns and method...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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Chemical-amplification-type negative resist composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent

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Chemical-amplification-type negative resist composition and meth

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent

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Chemical-sensitization photoresist composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent

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Chemical-sensitization photoresist composition

Organic compounds -- part of the class 532-570 series – Organic compounds – Nitriles
Patent

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Profile ID: LFUS-PAI-P-174439

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