Method of developing positive photoresist and compositions there

Details Method of developing positive photoresist and compositions there Method of developing positive photoresist and compositions there

1997-10-27

1998-10-13

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430165, 430331, G03F 730

Patent

active

058210369

ABSTRACT:
A method and composition for developing positive photoresists is illustrated. The developer of the present invention includes an ammonium hydroxide aqueous base and a surfactant of the fluorinated alkyl alkoxylate class most preferably present in an amount of from 10 to 30 ppm. A particularly preferred surfactant includes sulfonyl and amine moieties.

REFERENCES:
patent: 4628023 (1986-12-01), Gawston et al.
patent: 4710449 (1987-12-01), Lewis et al.
patent: 4732836 (1988-03-01), Potvin et al.
patent: 4784937 (1988-11-01), Tanaka et al.
patent: 4863827 (1989-09-01), Jain et al.
patent: 5039595 (1991-08-01), Schwalm et al.

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