Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1989-05-22
1991-05-21
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430325, 430324, 430330, 430942, 430967, 430328, 522915, G03F 726
Patent
active
050174584
ABSTRACT:
The method for production of a graft copolymer according to the present invention includes the step of adding to a base polymer capable of forming first radicals when irradiated with radiation an additive capable of combining with said first radicals to form second radicals stable against oxygen, the step of irradiating said base polymer containing the additive with radiation, and the step of introducing a monomer under an atmosphere free from oxygen, thereby to graft copolymerize said irradiated base polymer and said monomer.
REFERENCES:
patent: 4960676 (1990-10-01), Mochiji et al.
Gazard et al, "Lithographic Technique Using Radiation-Induced Grafting of Acrylic Acid into Poly(methylmethacrylate) Films", Poymer Engineering and Science, Nov. 1980, vol. 20, No. 16, pp. 1069-1072.
Kimura Takeshi
Mochiji Kozo
Oizumi Hiroaki
Soda Yasunari
Hamilton Cynthia
Hitachi , Ltd.
LandOfFree
Method for production of graft copolymer, pattern replication me does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for production of graft copolymer, pattern replication me, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for production of graft copolymer, pattern replication me will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-237559