4. X-ray or gamma ray systems or devices
  5. Specific application
  6. Lithography

Hiroaki Oizumi

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Light exposure method

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate

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Method for forming pattern by using graft copolymerization

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent

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Method for production of graft copolymer, pattern replication me

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent

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Optical element and projection exposure apparatus employing the

X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent

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Pattern fabrication by radiation-induced graft copolymerization

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent

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Profile ID: LFUS-PAI-P-68078

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