Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1997-03-10
1999-01-19
Nuzzolillo, M.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419235, 20429831, 20429834, 20419233, C23C 1434, H01J 3734
Patent
active
058610863
ABSTRACT:
A method and apparatus for conditioning a surface of a ceramic body in a process chamber when the process chamber has a vacuum pump, an anode and a cathode. The conditioning method consists of pumping the process chamber down to a vacuum with the vacuum pump, introducing a gas into the chamber, energizing the anode and cathode with RF power to ignite the gas into a plasma, sputter etching the surface with ions from the plasma to remove contaminants therefrom. The method is accomplished either within a process chamber to condition, in situ, a ceramic chuck or within a cleaning chamber to condition any form of ceramic body or component.
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Burkhart Vince
Khurana Nitin
Parkhe Vijay
Sansoni Steve
Tzou Eugene
Applied Materials Inc.
McDonald Rodney G.
Nuzzolillo M.
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