Method and apparatus for process monitoring

Active solid-state devices (e.g. – transistors – solid-state diode – Test or calibration structure

Reexamination Certificate

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Reexamination Certificate

active

06936842

ABSTRACT:
Embodiments of the invention provide an apparatus and method to determine the health of a substrate process such as, for example, a pre-clean process using plasma to remove copper oxide from a copper layer on a substrate, and the point at which the process has ended. In one aspect, optical characteristics and/or chamber impedance are used to determine the process end-point and/or process chamber health.

REFERENCES:
patent: 6182602 (2001-02-01), Redeker
patent: 6413867 (2002-07-01), Sarfaty et al.

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