4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Haojiang Li

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Independent gas feeds in a plasma reactor

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Method and apparatus for process monitoring

Active solid-state devices (e.g. – transistors – solid-state diode – Test or calibration structure
Reexamination Certificate

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Monitoring process for oxide removal

Semiconductor device manufacturing: process – With measuring or testing
Reexamination Certificate

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Oxide etch process with high selectivity to nitride suitable...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1209113

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