Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2006-08-29
2006-08-29
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S298110
Reexamination Certificate
active
07097744
ABSTRACT:
In one embodiment, a target alignment surface disposed on a target support mechanically engages a darkspace shield alignment surface disposed on a darkspace shield as the target is lodged into a chamber body. The respective alignment surfaces are shaped and positioned so that the darkspace shield is physically moved to a desired aligned position as the alignment surfaces engage each other. In this manner a darkspace shield may be directly aligned to a target within a semiconductor fabrication chamber to provide a suitable darkspace gap between the target and the darkspace shield.
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Chen Anthony
Forster John C.
Liu Alan Barry
Rosenstein Michael
Schweitzer Marc O.
Applied Materials Inc.
Konrad Raynes & Victor & Mann LLP
McDonald Rodney G.
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