Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Reexamination Certificate
2006-11-21
2006-11-21
Lee, Wilson (Department: 2163)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
C250S427000
Reexamination Certificate
active
07138768
ABSTRACT:
An indirectly heated cathode ion source includes an arc chamber housing that defines an arc chamber, an indirectly heated cathode and a filament for heating the cathode. The cathode may include an emitting portion having a front surface, a rear surface and a periphery, a support rod attached to the rear surface of the emitting portion, and a skirt extending from the periphery of the emitting portion. A cathode assembly may include the cathode, a filament and a clamp assembly for mounting the cathode and the filament in a fixed spatial relationship and for conducting electrical energy to the cathode and the filament. The filament is positioned in a cavity defined by the emitting portion and the skirt of the cathode. The ion source may include a shield for inhibiting escape of electrons and plasma from a region outside the arc chamber in proximity to the filament and the cathode.
REFERENCES:
patent: 3621324 (1971-11-01), Fink
patent: 3979634 (1976-09-01), Jaillet et al.
patent: 4573186 (1986-02-01), Reinhold
patent: 4714834 (1987-12-01), Shubaly
patent: 5204145 (1993-04-01), Gasworth
patent: 5262652 (1993-11-01), Bright et al.
patent: 5497006 (1996-03-01), Sferlazzo et al.
patent: 5517077 (1996-05-01), Bright et al.
patent: 5554852 (1996-09-01), Bright et al.
patent: 5703372 (1997-12-01), Horsky et al.
patent: 5763890 (1998-06-01), Cloutier et al.
patent: 5886355 (1999-03-01), Bright et al.
patent: 6348764 (2002-02-01), Chen et al.
patent: 6452338 (2002-09-01), Horsky
patent: 6777686 (2004-08-01), Olson et al.
patent: 2001/0042836 (2001-11-01), Varian
patent: 2001/0043040 (2001-11-01), Varian
patent: 252249 (1947-12-01), None
patent: 0215626 (1987-03-01), None
patent: 0840346 (1998-05-01), None
patent: 0851453 (1998-07-01), None
patent: 1053508 (1954-02-01), None
patent: 2105407 (1971-11-01), None
patent: 2327513 (1999-01-01), None
patent: WO 97/32335 (1997-09-01), None
patent: WO 99/04409 (1999-01-01), None
Bergeron Curt D.
Chang Shengwu
Distaso Daniel
Klos, Jr. Leo V.
Maciejowski Peter E.
Lee Wilson
Varian Semiconductor Equipment Associates Inc.
LandOfFree
Indirectly heated cathode ion source does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Indirectly heated cathode ion source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Indirectly heated cathode ion source will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3695048