Illumination system particularly for microlithography

Details Illumination system particularly for microlithography Illumination system particularly for microlithography

2006-02-02

2008-10-28

Ho, Allen C. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Lithography

C250S492100, C250S50400H, C355S067000

Reexamination Certificate

active

07443948

ABSTRACT:
There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.

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