4. X-ray or gamma ray systems or devices
  5. Specific application
  6. Lithography

Jörg Schultz

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Components with an anamorphotic effect for reducing an...

Optical: systems and elements – Single channel simultaneously to or from plural channels – By surface composed of lenticular elements
Reexamination Certificate

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Control of a distribution of illumination in an exit pupil...

Photocopying – Projection printing and copying cameras – Illumination systems or details
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Illumination system and REMA objective with lens...

Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate

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Illumination system particularly for EUV lithography

X-ray or gamma ray systems or devices – Specific application – Lithography
Reexamination Certificate

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Illumination system particularly for microlithography

X-ray or gamma ray systems or devices – Specific application – Lithography
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Profile ID: LFUS-PAI-P-2039199

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