4. Optical: systems and elements
  5. Lens
  6. With field curvature shaping

Udo Dinger

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6-mirror microlithography projection objective

Optical: systems and elements – Compound lens system – With curved reflective imaging element
Reexamination Certificate

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Collector for an illumination system

Radiant energy – Radiant energy generation and sources – With radiation modifying member
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Illumination system particularly for EUV lithography

X-ray or gamma ray systems or devices – Specific application – Lithography
Reexamination Certificate

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Illumination system particularly for microlithography

Optical: systems and elements – Single channel simultaneously to or from plural channels – By partial reflection at beam splitting or combining surface
Reexamination Certificate

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Illumination system particularly for microlithography

X-ray or gamma ray systems or devices – Specific application – Lithography
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1481856

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