Fluoroalkyl acrylate resist material and process for forming fin

Details Fluoroalkyl acrylate resist material and process for forming fin Fluoroalkyl acrylate resist material and process for forming fin

1985-03-11

1987-08-11

Schofer, Joseph L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430270, 430296, 430331, G03C 500

Patent

active

046861688

ABSTRACT:
A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula: ##STR1## wherein R.sub.1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R.sub.2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R.sub.f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an .alpha.-cyanoacrylate.

REFERENCES:
patent: 4262081 (1981-04-01), Bowden et al.
patent: 4421843 (1983-12-01), Hattori et al.

Affiliated with

Also associated with

Rating

Fluoroalkyl acrylate resist material and process for forming fin does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fluoroalkyl acrylate resist material and process for forming fin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluoroalkyl acrylate resist material and process for forming fin will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-402651