Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent
1997-09-03
1998-10-06
Evans, F. L.
Optics: measuring and testing
By configuration comparison
With photosensitive film or plate
25055927, G01B 1106
Patent
active
058185968
ABSTRACT:
A sample is placed on a sample receiving stage for receiving the sample. The sample is transferred one at a time to a measuring table, and a thickness of a thin film formed on a surface of the sample is measured by irradiating the surface of the sample with a measuring light beam. A covering structure is disposed between the sample receiving stage and the measuring table to define a sample transfer space and a measuring space in which the measuring table is disposed. A high-purity purging gas containing only a very small amount of contaminants is supplied through purging gas supply devices into the transfer space and the measuring space covered with the covering structure.
REFERENCES:
patent: 5393624 (1995-02-01), Ushijima
Amemiya Masaaki
Hasebe Kazuhide
Imai Masayuki
Kaneko Norihito
Evans F. L.
Tokyo Electron Ltd.
LandOfFree
Film thickness measuring apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Film thickness measuring apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Film thickness measuring apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-85002