4. Optics: measuring and testing
  5. By configuration comparison
  6. With photosensitive film or plate

Kazuhide Hasebe

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Film formation apparatus and method for semiconductor process

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Film formation apparatus and method for semiconductor process

Coating apparatus – Gas or vapor deposition
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Film formation apparatus and method for using same

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Film formation apparatus and method for using the same

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
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Film formation apparatus and method of using the same

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
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Profile ID: LFUS-PAI-P-186390

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