Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1999-04-28
1999-12-07
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
25044211, 25049221, G03C 500, G21K 510
Patent
active
059980974
ABSTRACT:
An energy beam source is used in micro-fabrication tasks, such as fabrication of specific patterns, in-situ bonding, repair, connection and disconnection of electrical paths, applicable to semiconductor devices and other micro-sized circuits in integrated circuits. The beam source is made compact so that several sources can be located inside a vacuum vessel and in conjunction with micro-manipulators or micro-movement stages operated under light or an electron microscope. The beam source is provided with at least three electrodes, and by applying a selected voltage, i.e., high frequency voltage, direct current voltage and ground voltage, on each the three electrodes in association with film-forming substance(s), virtually any type of deposit can be formed at any location of a workpiece. Different types of particle beams, such as positive and negative ion beams, a highspeed neutral atomic beam, a radical particle beam, an electron beam can be produced from the beam source by judicious choice of operating-parameters and the film-forming material which may be a process gas or an applied coating. By using the beam source and the method of deposit forming presented, virtually any type of fabrication task can be carried out on any surface and any location of a workpiece in a three-dimensional space.
REFERENCES:
patent: 4128765 (1978-12-01), Franks
patent: 4324854 (1982-04-01), Beauchamp et al.
patent: 4505949 (1985-03-01), Jelks
patent: 4510386 (1985-04-01), Franks
patent: 4757179 (1988-07-01), Matrisian et al.
patent: 4775789 (1988-10-01), Albridge et al.
patent: 4793908 (1988-12-01), Scott et al.
patent: 4870284 (1989-09-01), Hashimoto et al.
patent: 4874459 (1989-10-01), Coldren et al.
patent: 5113072 (1992-05-01), Yamaguchi et al.
patent: 5135695 (1992-08-01), Marcus
patent: 5149973 (1992-09-01), Morimoto
patent: 5223692 (1993-06-01), Lozier
patent: 5468595 (1995-11-01), Livesay
patent: 5554853 (1996-09-01), Rose
Tetsuro Nakamura et al., "Fabrication Technology of Integrated Circuit", published by Sangyo Tosho Publishing Company (Japan), 1987, pp. 21-23.
Fusao Shimokawa et al., J. Appl. Phys. 66(6), Sep. 15, 1989, published by American Institute of Physics, 1989, pp. 2613-2618.
Nuclear Instruments & Methods In Physics Research, Section--B: Beam Interactions With Materials And Atoms, vol. B33, No. 1-04, Jun. 2, 1988, pp. 867-870, XP 000022017, Shimokawa, F. et al., 'A Low-Energy Fast-atom Source'; p. 867, left column, last paragraph; Figure 1.
Hatakeyama Masahiro
Hatamura Yotaro
Ichiki Katsunori
Kobata Tadasuke
Nakao Masayuki
Ashton Rosemary
Baxter Janet
Ebara Corporation
Hatamura Yotaro
LandOfFree
Fabrication method employing energy beam source does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fabrication method employing energy beam source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fabrication method employing energy beam source will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-822093