Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1995-05-26
1996-12-10
Fleming, Fritz M.
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
H02N 1300
Patent
active
055837379
ABSTRACT:
An electrostatic chuck for holding a wafer in a plasma processing chamber, the chuck including a pedestal having a top surface, an internal manifold for carrying a cooling gas, and a first plurality of holes leading from the internal manifold toward said top surface; and a dielectric layer on the top surface of the pedestal. The dielectric layer has a top side and second plurality of holes, each of which is aligned with a different one of the holes of the first plurality of holes in the pedestal. The first and second holes form a plurality of passages extending from the internal manifold to the top side of the dielectric layer and through which the cooling gas is supplied to the backside of the wafer. Each of the first holes and the second hole aligned therewith form a different one of the plurality of passages. The passages are concentrated in regions of the dielectric layer that are in proximity to regions of higher leakage of cooling gas when the wafer is held against the electrostatic chuck by an electrostatic force.
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Bright Nicolas J.
Collins Kenneth S.
Ding Jian
Ishikawa Tetsuya
Marks Jeffrey
Applied Materials Inc.
Fleming Fritz M.
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