Electrostatic chuck for high power plasma processing

Details Electrostatic chuck for high power plasma processing Electrostatic chuck for high power plasma processing

1992-12-02

1994-09-27

Bueker, Richard

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

279128, H01L 2168

Patent

active

053504798

ABSTRACT:
An electrostatic chuck for holding an article to be processed in a plasma reaction chamber and comprising a metal pedestal coated with a layer of dielectric material in which is formed a cooling gas distribution system for passing and distributing a cooling gas between the upper surface of the layer and the article when supported on the pedestal. The gas distribution system comprises a plurality of intersecting grooves formed entirely in the upper surface of the layer with small gas distribution holes through intersections of the grooves over upper ends of cooling gas receiving holes formed in an underside of the pedestal.

REFERENCES:
patent: 4565601 (1986-01-01), Kakehi
patent: 4645218 (1987-02-01), Ooshio
patent: 4771730 (1988-09-01), Tezuka
patent: 5055964 (1991-10-01), Logan
patent: 5103367 (1992-04-01), Horwitz
patent: 5151845 (1992-09-01), Watanabe

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