4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Application of energy to the gaseous etchant or to the...

Craig A. Roderick

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Apparatus for exciting a plasma in a semiconductor wafer process

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
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Electronically tuned matching network using predictor-corrector

Wave transmission lines and networks – Automatically controlled systems – Impedance matching
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Electronically tuned matching networks using adjustable inductan

Wave transmission lines and networks – Automatically controlled systems – Impedance matching
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Electronically tuned matching networks using adjustable inductan

Wave transmission lines and networks – Coupling networks – With impedance matching
Patent

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Electronically tuned matching networks using adjustable inductan

Inductor devices – Inductive regulators with no relatively moving parts
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Profile ID: LFUS-PAI-P-316892

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