Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1996-03-27
1997-09-23
Fleming, Fritz
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
H02N 1300
Patent
active
056711174
ABSTRACT:
An electrostatic chuck for securing a semiconductor wafer on a pedestal having multiple apertures for the introduction of cooling gas beneath the wafer. The multiple apertures reduce overheating near the wafer edge and provide lower temperature gradients across the wafer. The wafer is held by electrostatic force against a laminate of an electrode layer sandwiched between two dielectric layers in such a way that the laminate presents a planar surface to the wafer for a substantial distance beyond the outer edge of the electrode layer. The laminate construction ensures that a large wafer area beyond the outer edge of the electrode is in contact with the laminate, to minimize cooling gas leakage near the edge, and provides a longer useful life by increasing the path length of dielectric material between the electrode layer and potentially damaging plasma material surrounding the chuck.
REFERENCES:
patent: 4724510 (1988-02-01), Wicker et al.
patent: 4771730 (1988-09-01), Tezuka
patent: 5055964 (1991-10-01), Logan et al.
patent: 5099571 (1992-03-01), Logan et al.
patent: 5155652 (1992-10-01), Logan et al.
patent: 5207437 (1993-05-01), Barnes et al.
patent: 5213349 (1993-05-01), Elliott
patent: 5255153 (1993-10-01), Nozawa et al.
patent: 5270266 (1993-12-01), Hirano et al.
patent: 5275683 (1994-01-01), Arami et al.
patent: 5280156 (1994-01-01), Niori et al.
patent: 5315473 (1994-05-01), Collins et al.
patent: 5350479 (1994-09-01), Collins et al.
patent: 5382311 (1995-01-01), Ishikawa et al.
patent: 5426558 (1995-06-01), Sherman
patent: 5452510 (1995-09-01), Barnes et al.
patent: 5535090 (1996-07-01), Sherman
patent: 5539179 (1996-07-01), Nozawa et al.
patent: 5542559 (1996-08-01), Kawakami et al.
Birang Manoocher
Mak Alfred
Shamouilian Shamouil
Sherstinsky Semyon
Tam Simon W.
Applied Materials Inc.
Fleming Fritz
Heal Noel F.
Kwong Raymond Kam-On
LandOfFree
Electrostatic chuck does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrostatic chuck, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrostatic chuck will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1940609