Dishing and erosion monitor structure for damascene metal proces

Details Dishing and erosion monitor structure for damascene metal proces Dishing and erosion monitor structure for damascene metal proces

1996-06-24

1998-03-03

Meier, Stephen

Active solid-state devices (e.g., transistors, solid-state diode

Test or calibration structure

257621, 324671, 324688, 371 225, 437 8, 437974, H01L 2358, H01L 2940

Patent

active

057238740

ABSTRACT:
According to the preferred embodiment, an erosion and dishing monitor is provided that facilitates the accurate optimization of a planarization process as in semiconductor process. The dishing monitor comprises at least two monitor structure sets embedded in a semiconductor substrate, the monitor structure sets comprising a plurality of monitor structures connected together with a plurality of connective conductors. The erosion monitor comprises a plurality of elongated conductors embedded into a semiconductor substrate, the plurality of conductors having varying conductor widths and adjacent substrate widths.

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patent: 5321304 (1994-06-01), Rostoker
patent: 5337015 (1994-08-01), Lustig et al.
patent: 5444637 (1995-08-01), Smesny et al.

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