Diagnostic pedestal assembly for a semiconductor wafer processin

Details Diagnostic pedestal assembly for a semiconductor wafer processin Diagnostic pedestal assembly for a semiconductor wafer processin

1997-06-24

1999-11-23

Breneman, R. Brian

Coating apparatus

Gas or vapor deposition

Work support

118723R, 118723E, 156345, C23C 1600

Patent

active

059893494

ABSTRACT:
A diagnostic pedestal assembly for measuring ion current and DC bias voltage within a high-power plasma reaction chamber of a semiconductor wafer processing system. The diagnostic pedestal assembly contains an aperture located in a surface of the pedestal and a probe element that is supported within the aperture.

REFERENCES:
patent: 5451784 (1995-09-01), Loewenhardt et al.
patent: 5667701 (1997-09-01), Sato et al.
patent: 5885402 (1999-03-01), Esquibel
patent: 5906684 (1999-05-01), Tamura et al.

Affiliated with

Also associated with

Rating

Diagnostic pedestal assembly for a semiconductor wafer processin does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Diagnostic pedestal assembly for a semiconductor wafer processin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Diagnostic pedestal assembly for a semiconductor wafer processin will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1216788