4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Hongching Shan

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Adjustable dc bias control in a plasma reactor

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

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Adjusting DC bias voltage in plasma chamber

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Adjusting DC bias voltage in plasma chamber

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Apparatus for improving wafer and chuck edge protection

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent

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Ashable layers for reducing critical dimensions of...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Profile ID: LFUS-PAI-P-365601

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