Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2006-07-25
2006-07-25
Vinh, Lan (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S221000, C438S706000, C438S723000
Reexamination Certificate
active
07081414
ABSTRACT:
A deposition/etching/deposition process is provided for filling a gap in a surface of a substrate. A liner is formed over the substrate so that distinctive reaction products are formed when it is exposed to a chemical etchant. The detection of such reaction products thus indicates that the portion of the film deposited during the first etching has been removed to an extent that further exposure to the etchant may remove the liner and expose underlying structures. Accordingly, the etching is stopped upon detection of distinctive reaction products and the next deposition in the deposition/etching/deposition process is begun.
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Chen Xiaolin
Krishnaraj Padmanabhan
Li DongQing
Li Zhuang
Moghadam Farhad K
Townsend and Townsend / and Crew LLP
Vinh Lan
LandOfFree
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