Density-aware dynamic leveling in scanning exposure systems

Photocopying – Projection printing and copying cameras – Focus or magnification control

Reexamination Certificate

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C355S053000, C355S077000

Reexamination Certificate

active

11163409

ABSTRACT:
A method and apparatus are provided for improving the leveling and, consequently, the focusing of a substrate such as a wafer during the photolithography imaging procedure of a semiconductor manufacturing process. The invention performs a pre-scan of the wafer's topography and assigns importance values to different regions of the wafer surface. Exposure focus instructions are calculated based on the topography and importance values of the different regions and the wafer is then scanned and imaged based on the calculated exposure focus instructions.

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English trranslation of JP 2003-124113 cited on Applicant's PTO-1449.
U.S. Appl. No. 10/905,706, filed Jan. 18, 2005, Brodsky et al.

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