Cleaning and liquid contact with solids – Apparatus – With means to movably mount or movably support the work or...
Reexamination Certificate
2005-05-31
2005-05-31
Kornakov, M. (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
With means to movably mount or movably support the work or...
C134S137000, C134S184000, C134S186000, C134S189000, C134S190000, C134S198000, C134S199000, C134S200000, C134S902000, C156S345180, C438S905000
Reexamination Certificate
active
06899111
ABSTRACT:
The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the cleaning chamber includes a chamber body having a processing cavity defined therein. A substrate is disposed in the processing cavity without contacting other chamber components by a Bernoulli effect and/or by a fluid cushion above and/or below the substrate. Fluid is flowed into the processing cavity at an angle relative to a radial line of the substrate to induce and/or control rotation of the substrate during a cleaning and drying process.
REFERENCES:
patent: 3597289 (1971-08-01), Kohl et al.
patent: 4557785 (1985-12-01), Ohkuma
patent: 4571850 (1986-02-01), Hunt et al.
patent: 4622918 (1986-11-01), Bok
patent: 4781764 (1988-11-01), Leenaars
patent: 4788992 (1988-12-01), Swainbank et al.
patent: 4911761 (1990-03-01), McConnell et al.
patent: 4984597 (1991-01-01), McConnell et al.
patent: 5055138 (1991-10-01), Slinn
patent: 5090432 (1992-02-01), Bran
patent: 5094013 (1992-03-01), Martin et al.
patent: 5183067 (1993-02-01), Slinn
patent: 5243768 (1993-09-01), Fukao et al.
patent: 5286657 (1994-02-01), Bran
patent: 5333628 (1994-08-01), Ogata et al.
patent: 5335681 (1994-08-01), Schmid
patent: 5339842 (1994-08-01), Bok
patent: 5351419 (1994-10-01), Franka et al.
patent: 5365960 (1994-11-01), Bran
patent: 5371950 (1994-12-01), Schumacher
patent: 5437733 (1995-08-01), Okumura
patent: 5520744 (1996-05-01), Fujikawa et al.
patent: 5539995 (1996-07-01), Bran
patent: 5542441 (1996-08-01), Mohindra et al.
patent: 5556479 (1996-09-01), Bran
patent: 5571337 (1996-11-01), Mohindra et al.
patent: 5634978 (1997-06-01), Mohindra et al.
patent: 5651379 (1997-07-01), Mohindra et al.
patent: 5656097 (1997-08-01), Olesen et al.
patent: 5660642 (1997-08-01), Britten
patent: 5685327 (1997-11-01), Mohindra et al.
patent: 5772784 (1998-06-01), Mohindra et al.
patent: 5778554 (1998-07-01), Jones
patent: 5868150 (1999-02-01), Mohindra et al.
patent: 5873947 (1999-02-01), Mohindra et al.
patent: 5878760 (1999-03-01), Mohindra et al.
patent: 5891256 (1999-04-01), Mohindra et al.
patent: 5908509 (1999-06-01), Olesen et al.
patent: 5950645 (1999-09-01), Olesen et al.
patent: 5979475 (1999-11-01), Satoh et al.
patent: 5996595 (1999-12-01), Olesen et al.
patent: 6059893 (2000-05-01), Kawasaki
patent: 6589361 (2003-07-01), Luscher et al.
patent: 2 176 908 (1985-10-01), None
patent: 2 185 444 (1986-08-01), None
patent: 2 183 552 (1986-10-01), None
patent: 98/01890 (1998-01-01), None
patent: 01/99156 (2001-12-01), None
Carducci James D.
Luscher Paul E.
Salimian Siamak
Welch Michael D.
Applied Materials Inc.
Kornakov M.
Moser Patterson & Sheridan
LandOfFree
Configurable single substrate wet-dry integrated cluster... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Configurable single substrate wet-dry integrated cluster..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Configurable single substrate wet-dry integrated cluster... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3370133